A Study on the Fabrication and Structural Properties of Al-Co/AlN-Co Thin Films

作者：Han Chang Suk^*; Han Seung Oh

来源：Journal of the Korean Institute of Metals and Materials, 2011, 49(3): 256-263.

DOI：10.3365/KJMM.2011.49.3.256

• thin films
• sputtering
• magnetic properties
• X-ray diffraction
• resistivity

We have synthesized Al-Co/AlN-Co multilayer films with different layer thicknesses by using a Two-Facing Target Type dc Sputtering (TFTS) system. The deposited films were annealed isothermally at different temperatures and their microstructure, magnetic properties and resistivity were investigated. The magnetization of the as-deposited films was found to be very small, irrespective of layer thickness. It was found that the annealing conditions and layer thickness ratio of Al-Co to AlN-Co (LTR) were able to control the microstructure, as well as the physical properties of the prepared films. The resistivity and magnetization increased and the coercivity decreased with a decreasing LTR. A high resistivity of 2500 mu Omega-cm, a magnetization of 360 emu/cm(3), and a coercivity of 5 Oe were obtained for the films with LTR=0.175.

• 出版日期2011-3