Ultrafast laser plasma doping of Er3+ ions in silica-on-silicon for optical waveguiding applications

作者：Kamil Suraya Ahmad; Chandrappan Jayakrishnan^*; Murray Matthew; Steenson Paul; Krauss Thomas F; Jose Gin

来源：Optics Letters, 2016, 41(20): 4684-4687.

DOI：10.1364/OL.41.004684

An ultrafast laser plasma doping (ULPD) technique is used for high concentration doping of erbium ions into silica-on-silicon substrate. The method uses a femtosecond laser to ablate material from TeO2-ZnO-Na2O-Er2O3 (Er-TZN) target glass. The laser-generated plasma modifies the silica network, producing a high-index-contrast optical layer suited to the production of on-chip integrated optical circuits. Cross-sectional analysis using scanning electron microscope with energy dispersive x-ray spectroscopy revealed homogeneous intermixing of the host silica with Er-TZN, which is unique to ULPD. The highly doped layer exhibits spectroscopic characteristics of erbium with photoluminescence lifetimes from 10.79 to 14.07 ms.

• 出版日期2016-10-15