Aluminum recycling from reactor walls: A source of contamination in a-Si:H thin films

作者：Longeaud C^*; Ray P P; Bhaduri A; Daineka D; Johnson E V; Roca i Cabarrocas P

来源：Journal of Vacuum Science and Technology A, 2010, 28(6): 1381-1387.

DOI：10.1116/1.3503620

In this article, the authors investigate the contamination of hydrogenated amorphous silicon thin films with aluminum recycled from the walls and electrodes of the deposition reactor. Thin films of hydrogenated amorphous silicon were prepared under various conditions by a standard radio frequency plasma enhanced chemical vapor deposition process in two reactors, the chambers of which were constructed of either aluminum or stainless steel. The authors have studied the electronic properties of these thin films and have found that when using an aluminum reactor chamber, the layers are contaminated with aluminum recycled from the chamber walls and electrode. This phenomenon is observed almost independently of the deposition conditions. The authors show that this contamination results in slightly p-doped films and could be detrimental to the deposition of device grade films. The authors also propose a simple way to control and eventually suppress this contamination.

• 出版日期2010-11