Dimensional characterization of biperiodic imprinted structures using optical scatterometry

作者：Gereige Issam^*; Pietroy David; Eid Jessica; Gourgon Cecile

来源：Microelectronic Engineering, 2013, 112: 27-30.

DOI：10.1016/j.mee.2013.05.022

• Nanoimprint lithography
• Optical scatterometry
• 2D patterns

In this paper, we report on the characterization of biperiodic imprinted structures using a non-destructive optical technique commonly called scatterometry. The nanostructures consist of periodic arrays of square and circular dots which were imprinted in a thermoplastic polymer by thermal nanoimprint lithography. Optical measurements were performed using spectroscopic ellipsometry in the spectral region of 1.5-4 eV. The geometrical profiles of the imprinted structures were reconstructed using the Rigorous Coupled-Wave Analysis (RCWA) to model the diffraction phenomena by periodic gratings. The technique was also adapted for large scale evaluation of the imprint process. Uniqueness of the solution was examined by analyzing the diffraction of the structure at different experimental conditions, for instance at various angles of incidence.

• 出版日期2013-12