Atomic layer stack deposition-annealing synthesis of CuWO4

作者：Gao Yuan; Zandi Omid; Hamann Thomas W

来源：Journal of Materials Chemistry A, 2016, 4(8): 2826-2830.

DOI：10.1039/c5ta06899a

A stack deposition-annealing (SDA) approach was demonstrated for the synthesis of CuWO4 via atomic layer deposition (ALD). The resulted CuWO4 showed promising activity as a photoanode for photoelectrochemical (PEC) water splitting. This methodology can, in principal, be utilized for the ALD ofmany ternary and quaternary oxides for various applications.

• 出版日期2016