Atomic contact potential variations of Si(111)-7 x 7 analyzed by Kelvin probe force microscopy

作者:Kawai Shigeki*; Glatzel Thilo; Hug Hans Josef; Meyer Ernst
来源:Nanotechnology, 2010, 21(24): 245704.
DOI:10.1088/0957-4484/21/24/245704

摘要

We studied atomic contact potential variations of Si(111)-7 x 7 by Kelvin probe force microscopy with the amplitude modulation technique at the second resonance of a silicon cantilever. Enhanced sensitivity due to the high mechanical quality factor in ultra-high vacuum enabled local contact potential difference (LCPD) measurements of individual adatoms. The contrast of the measured LCPD map became stronger by reducing the tip-sample distance, and the averaged LCPD value shifted to more negative. The short-range interaction, arising from the covalent bonding interactions, strongly affects the LCPD measurement. Theoretical calculations indicate that the amplitude modulation method has a higher sensitivity than the frequency modulation method in practical cases. The tip-sample distance dependence of LCPD was investigated by numerical calculations.

  • 出版日期2010-6-18