A simple one-step approach to fabrication of highly hydrophobic silk fabrics

作者：Chen, Fengxiang; Liu, Xin; Yang, Huiyu; Dong, Binghai; Zhou, Yingshan; Chen, Dongzhi; Hu, Hang; Xiao, Xingfang; Fan, Difei; Zhang, Chunhua; Cheng, Fan; Cao, Yunhe; Yuan, Tian; Liang, Zihui; Li, Jing; Wang, Shimin^*; Xu, Weilin

来源：Applied Surface Science, 2016, 360: 207-212.

DOI：10.1016/j.apsusc.2015.10.186

• Atomic layer deposition
• Silk fabrics
• TiO2
• Hydrophobicity

Highly hydrophobic silk fabric surfaces were successfully fabricated using a simple one-step atomic layer deposition (ALD) process. The surface morphology, chemical composition, and structure of bare silk fabric and silk fabrics coated with titanium dioxide (TiO2) subjected to 800 and 1600 ALD cycles were measured using scanning electron microscopy (SEM), field-emission scanning electron microscopy (FESEM), energy-dispersive spectroscopy (EDS), X-ray diffraction (XRD), and scanning probe microscopy (SPM). The surface wettability of the silk fabrics was evaluated by determining their static water contact angles (WCAs) and roll-off angles. The results suggest that the good hydrophilicity of the surfaces of bare silk fabrics can be changed to high hydrophobicity by the application of TiO2 nanoparticles to their surfaces using ALD. The high hydrophobicity achieved can be attributed to the increase in roughness of the silk fabric surface. The laundering durability of TiO2-coated silk fabrics is greatly improved by increasing the thickness of the ALD TiO2 films.

• 出版日期2016-1-1
• 单位武汉纺织大学; 湖北大学