A novel atomic layer deposition method to fabricate economical and robust large area microchannel plates

作者：Mane Anil U^*; Peng Qing; Wetstein Matthew J; Wagner Robert G; Frisch Henry J; Siegmund Oswald H W; Minot Michael J; Adams Bernhard W; Chollet Matthieu C; Elam Jeffrey W

来源：Conference on Micro- and Nanotechnology Sensors, Systems, and Applications III, 2011-04-25 to 2011-04-29.

DOI：10.1117/12.882885

• atomic layer deposition
• capillary arrays
• microchannel plate
• photodetector
• secondary electron emission
• resistive layer

We demonstrate a cost-effective and robust route to fabricate large-area microchannel plate (MCP) detectors, which will open new potential in larger area MCP-based detector technologies. For the first time, using our newly developed process flow we have fabricated large area (8"x8") MCPs. We used atomic layer deposition (ALD), a powerful thin film deposition technique, to tailor the electrical resistance and secondary electron emission (SEE) properties of large area, low cost, borosilicate glass capillary arrays. The self limiting growth mechanism in ALD allows atomic level control over the thickness and composition of resistive and SEES layers that can be deposited conformally on high aspect ratio capillary glass arrays. We have developed several robust and reliable ALD processes for the resistive coatings and SEE layers to give us precise control over the resistance (10(6)-10(10)Omega) and SEE coefficient (up to 5). This novel approach allows the functionalization of microporous, insulating substrates to produce MCPs with high gain and low noise. These capabilities allow a separation of the substrate material properties from the amplification properties. Here we describe a complete process flow to produce large area MCPs.

• 出版日期2011
• 单位中国社会科学院