科研之友
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摘要
A novel nanofabrication technique is developed for functional oxides. Combining nano-imprint lithography, sidewall-etching and sidewall-deposition processes enables us to prepare Mo hollow nanopillar masks with 100 and 60 nm window sizes, which is smaller than the original nano-imprint mold size of 250 nm. Using this Mo nanomask, extremely small epitaxial ferromagnetic oxide (Fe(2.5)Mn(0.5)O(4)) nanostructures can be directly grown on sapphire substrates at the deposition temperature of 350 degrees C in a pulsed laser deposition (PLD) process.
- 出版日期2011-5-6
