Development of High-current Pulsed Heavy-ion-beam Technology for Applications to Materials Processing

作者：Ito Hiroaki^*; Ochiai Yasushi; Masugata Katsumi

来源：Journal of the Korean Physical Society, 2011, 59(6): 3652-3656.

DOI：10.3938/jkps.59.3652

• Pulsed heavy-ion beam
• Magnetically insulated ion diode
• Bipolar pulse accelerator
• Pulsed power technology

Development of intense pulsed heavy ion beam technology for applications to materials processing is described. We have developed a magnetically insulated ion diode for the generation of intense pulsed metallic ion beams in which a vacuum arc plasma gun is used as the ion source. When the ion diode was successfully operated at a diode voltage of 220 kV and a diode current of 10 kA, an ion beam with an ion current density of >200 A/cm(2) and a pulse duration of 40 ns was obtained The ion composition was evaluated by using a Thomson parabola spectrometer, and the ion beam consisted of aluminum ions (Al((1-3)+)) with an energy of 140 - 740 keV and protons with an energy of 160 - 190 keV; the purity was estimated to be 89%, which was much higher than that of the pulsed ion beam produced in a conventional ion diode. The development of a bipolar pulse accelerator (BPA) was reported in order to improve the purity of intense pulsed ion beams. A double coaxial type bipolar pulse generator was developed as the power supply of the BPA. When a bipolar pulse with a voltage of +/- 90 kV and a pulse duration of about 65 ns was applied to the drift tube of the BPA, the ion beam with an ion current density of 2 A/cm(2) and a pulse duration of 30 ns was observed 25 mm downstream from the cathode surface, which suggested bipolar pulse acceleration.

• 出版日期2011-12