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摘要
In this paper, dendritic iron wire array films with different morphologies were prepared on Cu/ITO and slide ITO glass substrates by electrodeposition. The morphologies of Fe films obtained at different conditions were characterized by scanning electron microscopy. The growth mechanism of the dendritic Fe array is described by changing the ratio of deposition rate to mass transport rate (R) according to the experimental results. The variable R affects the final structure of the products. Especially, Fe dendrites can grow vertically layer by layer. The photoelectrochemical properties indicate that dendritic hematite (alpha-Fe2O3) arrays have a poor electron-hole (e-h) recombination effect.
- 出版日期2012
