A 1-kW SWITCHABLE DAMPED CLASS-E POWER AMPLIFIER FOR PLASMA PROCESSING APPLICATIONS

作者:Kim Ji Yeon; Chun Sang Hyun; Jang Dong Hee; Kim Jong Heon*; Kennedy Gray P
来源:Microwave and Optical Technology Letters, 2010, 52(11): 2438-2441.
DOI:10.1002/mop.25512

摘要

In this article, a new highly efficient and highly stable I kW power amplifier is designed and fabricated for plasma processing applications. The efficiency of the generator was Unproved by using a class-E type power amplifier consisting of one push-pull MOSFET and a high-current driver IC instead of a conventional class-C amplifier composed of several single ended MOSFETs. A switchable damper allows a selection of one of three different amplifier modes; these modes adjust the amplifier's efficiency and stability. The amplifier dimensions were reduced by 30% compared with the conventional class-C power amplifier. Also, a drain efficiency of 80% was produced for a generator output power of I kW and operating frequency of 13.56 MHz.

  • 出版日期2010-11