Development of InAlAsSb growth by MOVPE

作者:Slocum Michael; Forbes David V; Hillier Glen C; Smith Brittany L; Adams Jessica G J; Hubbard Seth M*
来源:Journal of Crystal Growth, 2017, 471: 15-20.
DOI:10.1016/j.jcrysgro.2017.04.020

摘要

The growth of InAlAsSb by metal-organic vapor phase epitaxy has been demonstrated, with a controllable antimony fraction exceeding 6%. Calculations have shown that InAlAsSb with Sb contents greater than 5-7% in the quaternary are within the miscibility gap, however this work demonstrates specific growth conditions that allow compositions well within the miscibility gap. From a study of the growth of AlAsSb and an evaluation of two aluminum precursors (TMAl versus TTBAI), growth temperature, and V/III ratio, a foundation is developed to optimize the growth of InAlAsSb. By tailoring V/III ratio, growth conditions were found to achieve high crystalline content of both indium and antimony. InAlAsSb was grown on InP with antimony fractions from 32% to 48%, for which indium fraction varied from 10% to 19%, which provides an expected direct bandgap ranging from 1.75 to 1.98 eV.

  • 出版日期2017-8-1