UV Irradiation Effect on Pattern Size Shrinkage of Sol-gel Indium Tin Oxide Replicated by Nanoimprint Lithography

作者：Kang Yuji^*; Okada Makoto; Haruyama Yuichi; Kanda Kazuhiro; Matsui Shinji

来源：Journal of Photopolymer Science and Technology, 2010, 23(1): 39-43.

DOI：10.2494/photopolymer.23.39

• Indium Tin Oxide (ITO)
• UV
• shrink
• sol-gel
• room temperature nanoimprint (RT-NIL)

The spin-coated ITO film can be delineated by room-temperature nanoimprint lithography (RT-NIL), but the patterns disappeared after 200 degrees C annealing process. To overcome the above problem, we examined 254 nm UV irradiation effect onto a spin-coated ITO film. However, this result suggests that UV irradiated pattern shrink in size. In this paper, we confirmed UV irradiation effect on pattern shrinkage of sol-gel ITO replicated by RT-NIL.

• 出版日期2010