A Combined Gas Cluster Ion Beam (GCIB) and Chemical-Mechanical Polish (CMP) Planarization Scheme for Tungsten Replacement Metal Gate (W-RMG)

作者:Tseng Wei Tsu; Long Justin; Mohan Kaushik; Kagalwala Taher; Wu Changhong; Truong Connie
来源:ECS Journal of Solid State Science and Technology, 2016, 5(7): P404-P408.
DOI:10.1149/2.0161607jss