Microstructure of Titanium Films after Absorbing Deuterium Gas or Irradiated by Deuterium Ions

作者：Liu Jiwei; Wang Boyu^*

来源：Rare Metal Materials and Engineering, 2013, 42: 292-295.

• titanium film
• microstructure
• slow positron annihilation technique

Titanium films, deposited onto molybdenum substrates, were then loaded with deuterium gas or implanted deuterium ion in electrostatic accelerator. Effects of absorbing or implanting deuterium on the microstructure of titanium films were studied by X-ray diffraction, scanning electron microscopy and slow positron annihilation technique. X-ray diffraction analysis of the films shows the single phase of the titanium and molybdenum in pure titanium films and titanium deuteride and molybdenum phase peaks in the titanium film after absorbing deuterium. The phase structure of pure titanium films is changed by absorbing deuterium, but not by implanting deuterium. The slow positron annihilation technique reflects a uniformity of defect in the depth direction before and after absorbing deuterium, and a large increase of defects after deuterium implantation, which indicates that the defect structure of the titanium films is changed by implanting deuterium. Scanning electron microscopy reflects the surface morphology of titanium films is not changed by absorbing deuterium. The non-uniformity on the surface of the titanium films decreases as a result of selective ablation under implanted deuterium.

• 出版日期2013-11
• 单位中国工程物理研究院