Adhesion of Rhodococcus sp S3E2 and Rhodococcus sp S3E3 to plasma prepared Teflon-like and organosilicon surfaces

作者：Lehocky Marian^*; St'ahel Pavel; Koutny Marek; Cech Jan; Ins*****is Jakub; Mracek Ales

来源：Journal of Materials Processing Technology, 2009, 209(6): 2871-2875.

DOI：10.1016/j.jmatprotec.2008.06.042

• Rhodococcus
• Plasma deposition
• Cell adhesion
• Barrier discharge
• Thin films

The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flow rate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma.

• 出版日期2009-3-19