Magnetic Field Improvement in End Region of Rectangular Planar DC Magnetron Based on Particle Simulation

作者：Qiu Qingquan^*; Li Qingfu; Su Jingjing; Jiao Yu; Finley Jim

来源：Plasma Science and Technology, 2008, 10(6): 694-700.

• magnetron sputtering
• plasma
• magnetic field
• erosion
• particle simulation

For a rectangular planar direct current (DC) magnetron, anomalous target erosion may occur in the curve-out region and inner side of the curved region. One key factor is that the magnetic field in the end region is weaker than that in the straight region, and another important factor may be that there is a circumferential component of the magnetic field in the curved region. Through a calculation of three-dimensional magnetic field for the rectangular magnetron, a magnet structure shimmed by permanent magnet bars and ferromagnetic bars is proposed to solve the above problems. Through a three-dimensional non-self-consistent particle simulation and the Yamamura/Tawara formula, the target erosion profile could be predicted. The simulation results show that for an improved uniformity in magnetic field, the entire target utilization could be much enhanced.

• 出版日期2008-12
• 单位西安交通大学