Diamond nucleation suppression in chemical vapor deposition process

作者：Fritzen CL; Balzaretti NM; Livi RP; de Souza JP; da Jornada JAH^*

来源：Diamond and Related Materials, 1999, 8(12): 2110-2117.

DOI：10.1016/S0925-9635(99)00173-9

• chemical vapor deposition
• nucleation suppression
• silicon

A systematic study of the effect of different pre-treatments of the Si substrate surface in suppressing diamond nucleation was performed to investigate the nature of the nucleation centers in chemical vapor deposition (CVD) of diamond. The Si substrates were initially scratched with diamond powder and then submitted to one of the following pre-treatments: thermal annealing in high vacuum and in air, deposition of an amorphous silicon film, and Kr-84(+) ion implantation. The pre-treated substrates were used in a hot filament CVD diamond process, and the diamond films obtained were analyzed by different techniques. The results suggest that the observed nucleation reduction under certain pre-treatment conditions is related to modifications induced on the original topographical features of the scratched substrate surface, which would be responsible for the CVD diamond nucleation. The dimensions of these surface features are estimated to be of the order of 5 nm.

• 出版日期1999-12