Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer

作者：Thungsuk Nuttee^*; Nuchuay Peerapong; Hirotani Daisuke; Okamura Yoshimi; Nakabayashi Kenichi; Kinoshita Hiroyuki; Yuji Toshifumi; Mungkung Narong; Kasayapanand Nat

来源：Vacuum, 2014, 109: 166-169.

DOI：10.1016/j.vacuum.2014.06.029

• Argon plus oxygen mixture gas
• Flexible solar cell
• Plasma CVD
• Surface treatment
• Low pressure

Even though silicon based solar cell currently has more efficient, the dye sensitized solar cell is considerably cheaper for manufacturing because of its low cost materials and simplicity process of fabrication. In this paper, the development of plasma formed equipments for thin film material on flexible solar cell using low-pressure high-frequency plasma chemical vapor deposition method on the surface of Si wafer with the mixture of Ar gas and O-2 gas is presented. The results indicate that using this method can be possible for surface modification.

• 出版日期2014-11