Antireflective sub-wavelength structures on fused silica via self-assembly of silica

作者：Du, Ying; Zhu, Meiping; Sui, Zhan; Yi, Kui; Jin, Yunxia; He, Hongbo^*

来源：Thin Solid Films, 2013, 548: 103-108.

DOI：10.1016/j.tsf.2013.09.004

• Antireflection
• Sub-wavelength structures
• Laser-induced damage threshold
• Self-assembly
• Porous film

Antireflective sub-wavelength structures with high laser-induced damage threshold on fused silica are fabricated using a self-assembly technique, in which a porous yttrium oxide film is deposited as a mask followed by alkaline etching. By controlling the etching time, several sub-wavelength structures with different height, density and diameter have been made. The best reflectance is less than 2.87% for wavelengths from 300 to 1000 nm after 1.5 h etching. The laser-induced damage threshold of the etched glass measured by a 10 ns Nd:YAG laser at a wavelength of 532 nm was as high as 30 J/cm(2) compared to 16 J/cm(2) of blank glass. The specular reflectance of structures matches the theoretical simulation using a thin-film multilayer model, and the results reveal that the shape of the structures is similar to the calculated parabolic shape. Achieving antireflective sub-wavelength structures on fused silica paves the way for applications in laser systems.

• 出版日期2013-12-2
• 单位中国科学院上海光学精密机械研究所; 中国科学院大学; 中国工程物理研究院; 中国工程物理研究院激光聚变研究中心