BN coatings prepared by low pressure chemical vapor deposition using boron trichloride-ammonia-hydrogen-argon mixture gases

作者：Cheng, Yu; Yin, Xiaowei^*; Liu, Yongsheng; Li, Siwei; Cheng, Laifei; Zhang, Litong

来源：Surface and Coatings Technology, 2010, 204(16-17): 2797-2802.

DOI：10.1016/j.surfcoat.2010.02.046

• Boron nitride
• Chemical vapor deposition
• Kinetics
• Coating

Boron nitride (BN) coatings were prepared by low pressure chemical vapor deposition (LPCVD) using boron trichloride (BCl3)-ammonia (NH3)-hydrogen (H-2)-argon (Ar) mixture gases. Thermodynamic analysis indicated that BN was the only solid product when the amount of NH3 was in excess at the temperature of 1000 degrees C and the total pressure of 1000 Pa. The deposited BN coating had a turbostratic structure, and the highly ordered graphite substrate may have an effect on the order degree of BN coating near coating/substrate interface. The turbostratic BN was transformed into well-crystallized hexagonal boron nitride (h-BN) after heat treatments at temperatures above 1300 degrees C. The deposition kinetics of LPCVD BN were investigated at the total pressure of 1000 Pa and temperatures of 650 degrees C, 800 degrees C and 1000 degrees C, respectively. It was concluded that the deposition process was controlled by the diffusion of BCl3 with an apparent activation energy of 1.3 eV.

• 出版日期2010-5-15
• 单位西北工业大学; 厦门大学