Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks

作者：Krishnamoorthy Sivashankar; Pugin Raphael; Brugger Juergen; Heinzelmann Harry; Hinderling Christian^*

来源：Advanced Materials, 2008, 20(10): 1962-+.

DOI：10.1002/adma.200702005

Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous hydrobhopic background or vice versa. The surfaces are shown to be excellent tools for the preparation of arrays of nanocrystals.

• 出版日期2008-5-19