An analytical expression for drain saturation voltage of polycrystalline silicon thin-film transistors

作者：Hao Han^*; Wang Mingxiang; Wong Man

来源：IEEE Electron Device Letters, 2008, 29(4): 357-359.

DOI：10.1109/LED.2008.917810

• drain saturation voltage
• output characteristic
• polycrystalline silicon
• thin-film transistors (TFTs)

A physical-based analytical expression for the drain saturation voltage V-Dsat of polycrystalline silicon (poly-Si) thin-film transistors (TFTs) is derived. V-Dsat is found to be dominated by the grain boundary potential barrier modulation effect, which can be readily estimated from the device transfer characteristic. Straightforward prediction Of YD at values at arbitrarily given gate voltages based on the proposed formula is demonstrated for both low temperature and high temperature processed poly-Si TFTs in either n- or p-type. The prediction agrees well with experimentally determined V-Dsat value. Derivation of the expression is based on our previously proposed analytical ON-state drain-current model for poly-Si TFTs, with no empirical factors included.

• 单位
  苏州大学; 香港科技大学