Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors

作者：Lu Pai; Ohlckers Per; Mueller Lutz; Leopold Steffen; Hoffmann Martin; Grigoras Kestutis; Ahopelto Jouni; Prunnila Mika; Chen Xuyuan^*

来源：Electrochemistry Communications, 2016, 70: 51-55.

DOI：10.1016/j.elecom.2016.07.002

• Supercapacitor
• Silicon nanorod array
• TiN nano film
• DRIE
• ALD

We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement incapacitance compared to flat TiN film electrode.

• 出版日期2016-9