Atomic Layer Engineering of Perovskite Oxides for Chemically Sharp Heterointerfaces

作者:Choi Woo Seok; Rouleau Christopher M; Seo Sung Seok A; Luo Zhenlin; Zhou Hua; Fister Timothy T; Eastman Jeffrey A; Fuoss Paul H; Fong Dillon D; Tischler Jonathan Z; Eres Gyula; Chisholm Matthew F; Lee Ho Nyung*
来源:Advanced Materials, 2012, 24(48): 6423-6428.
DOI:10.1002/adma.201202691

摘要

Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO3/SrTiO3 heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO3 grown at high oxygen pressure dramatically enhances interface abruptness.

  • 出版日期2012-12-18