摘要
The design of resistive RAM ( ReRAM) faces two major challenges: 1) cell area versus write current requirements and 2) cell read current () versus read disturbance. This paper proposes ReRAM macros using logic-process-based vertical parasitic-BJT ( VPBJT) switches and a corresponding cell array ( VPBJT-CA), resulting in a 4.5x macro density compared to conventional NMOS-switch ReRAM for given write current requirements. To overcome temperature-dependent fluctuations in the base-emitter voltage difference () of VPBJT, we propose a temperature-aware bitline ( BL) voltage bias ( TABB) scheme to provide current-mode sensing with 4.7x larger and 1.6x faster read speeds. Test results of fabricated 0.18 mu m 1 Mb and 65 nm 2 Mb VPBJT ReRAM macros confirm the efficacy of the temperature-aware, V-BL-R, resulting in sub-5-ns random read access times.
- 出版日期2014-4
- 单位清华大学