摘要

We report the results of numerical studies of the impact of asymmetric femtosecond pulses focused in the bulk of the material on the femtosecond modification of fused silica. It is shown that such pulses lead to localisation of absorption in the process of femtosecond modification and to a decrease in the threshold energy of modification. It is found that the optimal asymmetry parameters for reaching the maximum plasma density in the focusing region depend on the pulse energy: at an initial energy of about 100 nJ, it is preferable to use pulses with positive TOD; however, when the energy is increased, it is preferable to use pulses with negative TOD. This is explained by differences in the dynamics of the processes of absorption of energy of a pulse propagating in the material.

  • 出版日期2012