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摘要
A general physicochemical model describing the reactive sputtering process of metal targets in a medium of argon, nitrogen, and oxygen has been developed. The model is based on a surface chemical reaction of the oxynitride film formation that proceeds under the conditions of nonisothermal working surfaces of the sputtering system. A system of algebraic equations has been obtained for analytical description of the model and solved numerically for titanium oxynitride.
- 出版日期2012-7
