High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

作者：Starostin S A^*; Premkumar P Antony; Creatore M; de Vries H; Paffen R M J; van de Sanden M C M

来源：Applied Physics Letters, 2010, 96(6): 061502.

DOI：10.1063/1.3310024

• chemical analysis
• high-k dielectric thin films
• plasma CVD
• surface morphology
• surface roughness

The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast discharge imaging at 2 mu s exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.

• 出版日期2010-2-8