A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm

作者：Xiong Yi; Liu Zhaowei; Zhang Xiang^*

来源：Applied Physics Letters, 2009, 94(20): 203108.

DOI：10.1063/1.3141457

• lenses
• masks
• optical fabrication
• photolithography

We propose that a hyperlens can be used for photolithography to generate deep subwavelength arbitrary patterns from diffraction-limited masks. Numerical simulation shows that half-pitch resolution down to 20 nm is possible from a mask with 280 nm period at working wavelength 375 nm. We also extend the hyperlens projection concept from cylindrical interfaces to arbitrary interfaces. An example of a flat interface hyperlens is numerically demonstrated for lithography purposes.

• 出版日期2009-5-18