摘要
A difunctional methacrylate oligomer was mixed with a variable amount of a MAPTMS precursor in the presence of both a radical and a cationic photoinitiator. The simultaneous photolysis of both photosensitive molecules upon UV irradiation allowed the single- step generation of a type-II polymethacrylate/ polysiloxane nanocomposite film. Methacrylate and methoxysilyl conversions during irradiation were efficiently monitored by FTIR spectroscopy. The inorganic structure of the resulting silica-based hybrid films was characterized using 29 Si solid-state NMR. Finally, the reinforcement ability of the resulting hybrid films was also assessed by using a unique range of characterization techniques: DMA, scratch test, and nanoindentation.
- 出版日期2011-6-16