科研之友
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摘要
. A gas gas interface is used for generating a localized reactive plasma flow at an atmospheric pressure. A microfluidic chip is fabricated as the reactor integrating a small plasma source located upstream. Within a Y-shaped microchannel, a discharging gas flows with a chemical gas. Owing to the small width of the microchannel, the gas flow is stabilized in a laminar flow. The resultant gas-gas interface is formed in the area where two gases flow facing each other activating the chemical gas through the energetic species in the discharging gas. A characteristic stream pattern is observed as the etching profile of a carbon film with a sub-pm sharp step change that can be explained by the spatial distribution of the reactive oxygen. This etching profile is different from that obtained when plasma discharging occurs near the channel exit being affected by the turbulent flow.
- 出版日期2015-1
