Nanoscale Photolithography with Visible Light

作者：Fourkas John T^*

来源：Journal of Physical Chemistry Letters, 2010, 1(8): 1221-1227.

DOI：10.1021/jz1002082

Industrial approaches to improving lithographic resolution rely upon using radiation or charged particles of ever shorter wavelengths. Working with such light or particles is difficult and expensive. However, recently developed techniques show promise for performing nanoscale photolithography using visible light. The ability to employ visible light for nanoscale photolithography may facilitate considerable reductions in the difficulty and expense involved in the continued increase of transistor density in integrated circuits. In this Perspective, we review the physical chemistry of several of these new techniques and discuss future prospects for visible-light nanoscale photolithography.

• 出版日期2010-4-15