A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

作者：Anders Andre^*

来源：Surface and Coatings Technology, 2014, 257: 308-325.

DOI：10.1016/j.surfcoat.2014.08.043

• Cathodic arcs
• High power impulse magnetron sputtering
• HiPIMS
• Bias
• Deposition
• Review

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come as a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

• 出版日期2014-10-25