Autophotosensitive Negative Polyimide

作者:Wang, Rui; Jiang, Xuesong*; Yin, Jie
来源:Journal of Applied Polymer Science, 2009, 112(5): 3057-3062.
DOI:10.1002/app.29895

摘要

A novel autophotosensitive polyimide (APSPI) was synthesized through introducing berizophenone (BP) moiety into the backbone chain and acrylate group into side chain of PI. The BP moiety can generate active radicals, which can initiate acrylate group to form crosslinked network. The study of photosensitive properties revealed its good photolithographic properties, with a resolution about 12 pm and a sensitivity of 330 mJ/cm(2).

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