摘要
Measured relative densities as a function of O-2 addition in a CH3F/O-2 inductively coupled plasma changed abruptly for H, O, and particularly F atoms (factor of 4) at 48% O-2. A corresponding transition was observed in electron density, effective electron temperature, and gas temperature, as well as in C, CF, and CH optical emission. These abrupt transitions were attributed to the reactor wall reactivity, changing from a polymer-coated surface to a polymer-free surface and vice-versa, as the O-2 content in the feed gas crossed 48%.
- 出版日期2013-1-21