A dome-shaped cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition

作者：Su J J^*; Li Y F; Ding M H; Li X L; Liu Y Q; Wang G; Tang W Z

来源：Vacuum, 2014, 107: 51-55.

DOI：10.1016/j.vacuum.2014.04.002

• Diamond films
• MPCVD reactor
• Input microwave power
• Long-time operation

In this paper, a new type of microwave plasma chemical vapor deposition (MPCVD) reactor possessing a novel dome-shaped resonant cavity is described. Such a MPCVD reactor is required for efficient preparation of diamond films. It will be shown that by adopting a design outlined in this paper, a MPCVD reactor fulfilling all different requirements for reliable, long-time operation at high input microwave power levels could be optimized. Experimental results will be given showing that with the new MPCVD reactor, an input microwave power of up to 10 kW at 2.45 GHz could be applied, and at an input power of 8.5 kW, uniform and transparent polycrystalline diamond film of high quality and high purity could be deposited on 2 inch diameter silicon substrates, at a deposition rate of about 3.5 mu m/h.

• 出版日期2014-9
• 单位北京科技大学