A narrow-band, variable energy ion source derived from a wire plasma source

作者：Gueroult R^*; Elias P Q; Packan D; Rax J M

来源：Plasma Sources Science and Technology, 2011, 20(4): 045006.

DOI：10.1088/0963-0252/20/4/045006

A low pressure wire-induced plasma source (WIPS) operated in its high-pressure mode (similar to 10(-2) mbar) exhibits a narrow ion energy distribution function peaked at an energy corresponding to the discharge voltage. In order to take advantage of this peculiar feature, we design an electrode geometry enabling the acceleration of ions extracted from a WIPS. Probing of the obtained ion plume by means of a retarding potential analyser (RPA) demonstrates the capability of such an ion source to generate narrow-band (full width at half maximum of about 20 eV), variable energy (1 to 5 keV) ion beams. Comparison with particle-in-cell simulations of the WIPS shows that the energy spread of these ion beams is actually about 10 eV, the slight broadening being mainly the effect of the limited planar RPA energy resolution. The ion beam spot size measured at 6 cm of the ion source exit is about 3 mm for a 10 mu A He(+) beam at 2 keV, with a divergence of about one degree. Operating the WIPS in argon and xenon leads to similar properties for Ar(+) and Xe(+) beams, and in principle other species could also be used.

• 出版日期2011-8