Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet

作者：Lin Yung Sen^*; Lin Di Jiun; Sung Ping Ju; Tien Shih Wei

来源：Thin Solid Films, 2013, 532: 36-43.

DOI：10.1016/j.tsf.2012.11.100

• Atmospheric pressure plasma
• PECVD
• Electrochromism
• Nickel oxide

Deposition of electrochromic organonickel oxide (NiOxCy) films onto glass/indium tin oxide (ITO) substrates using atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet under various precursor injection angles is investigated. A precursor [nickelocene, Ni(C5H5)(2)] vapor, carried by argon gas and mixed with oxygen gas, is injected into an air plasma torch for the deposition of NiOxCy films by a short exposure of the substrate, 20 s, in the plasma. Uniform light modulation on glass/ITO/NiOxCy is produced while the moving glass/ITO substrate is exposed to the plasma torch at room temperature (similar to 23 degrees C) and under atmospheric pressure. Light modulation with up to a 40.9% transmittance variation at a wavelength of 513.9 nm under Li+ intercalation and de-intercalation in a 1 M LiClO4-propylene carbonate electrolyte is achieved.

• 出版日期2013-4-1