Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

作者：Salashchenko N N^*; Chkhalo N I

来源：Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques, 2012, 6(3): 464-472.

DOI：10.1134/S1027451012060213

The fundamental physical and technological problems of fabrication and testing, as well as new optics applications providing diffraction-quality images (with spatial resolutions varying from tens of nanometers to several nanometers) at wavelengths of 3-60 nm, are analyzed. This type of optical systems is required in the mass production of very large-scale integrated circuits (ICs) (projection nanolithography), nanocertification (high-resolution X-ray microscopy), macrodiagnosis (extraterrestrial astronomy), and in fundamental investigations of the interaction between a material (vacuum) and superstrong electromagnetic fields (10(20)-10(23) W/cm(2)). The current state of interaction studies around the world has been reviewed. The latest developments implemented in this area at the Institute for Physics of Microstructures, Russian Academy of Sciences, have been discussed.

• 出版日期2012-5