Gas Permeation Property of SiC Membrane Using Curing of Polymer Precursor Film by Electron Beam Irradiation in Helium Atmosphere

作者：Takeyama Akinori^*; Sugimoto Masaki; Yoshikawa Masahito

来源：Materials Transactions, 2011, 52(6): 1276-1280.

DOI：10.2320/matertrans.M2010418

• hydrogen
• silicon carbide
• membrane
• gas separation
• polycarbosilane
• radiation curing
• electron beam
• helium atmosphere

SiC membranes were prepared using curing of precursor polymer (polycarbosilane, PCS) film by electron beam irradiation in helium atmosphere. The membrane prepared via curing of PCS film coated using 10 mass% PCS solution for dip-coating followed by immersing it for 30 s in PCS solution, showed H-2 permeance of 3.1 x 10(-7) mol/m(2)/s/Pa and the selectivity of 51 at 523 K. The H-2 permeance of the membrane was increased proportional to the temperature by the activated diffusion of H-2. It indicates SiC film without pinholes or cracks formed on the support. As the pyrolysis temperature of cured PCS film was increased, the selectivity of the membrane reached the maximum at 923 K. [doi:10.2320/matertrans.M2010418]

• 出版日期2011-6