Large magnetoresistance of amorphous carbon films

作者：Saleemi, Awais Siddique; Singh, Rajan; Sun, Wen; Luo, Zhaochu; Zhang, Xiaozhong^*

来源：Carbon, 2017, 122: 122-127.

DOI：10.1016/j.carbon.2017.06.048

• Magnetoresistance
• Amorphous carbon
• Variable range hopping
• Localization length

Magnetoresistance (MR) of pure amorphous carbon thin films deposited by pulsed laser deposition at various deposition temperatures was studied. Maximum MR of 46% was observed at 2 K under the magnetic field of 7 T for the sample deposited at temperature of 500 degrees C. No tendency of MR saturation was observed up to 7 T. The MR decreases rapidly with the increase in measurement temperature and vanishes after 40 K. The transport mechanism of all the samples follow Efros-Shklovskii variable range hopping model. The characteristics temperature decreasing from 2540 K to 1290 K and localization length increasing from 5.3 nm to 10.7 nm with increasing fraction of C(sp(2)) from 72% to 84%. The lower disorder degree may results in higher MR.

• 出版日期2017-10
• 单位清华大学