Numerical studies on flow and thermal fields in MOCVD reactor

作者:Zhong ShuQuan*; Ren XiaoMin; Huang YongQing; Wang Qi; Huang Hui
来源:Chinese Science Bulletin, 2010, 55(6): 560-566.
DOI:10.1007/s11434-009-0590-8

摘要

A systematic study has been performed to investigate the flow and thermal patterns of vertical rotating Thomas Swan MOCVD reactor at low pressure, using 2-D dynamic modeling. By varying and calculating the several important process parameters of the reactor, the optimized conditions of the uniform distributions of velocity and temperature profiles in steady state have been obtained. Then, time-dependent models with the step response perturbation of the total gas rate can help identify the visual transient behavior inside the reactor and analyze the mechanism of delay time, relaxation oscillation and pulsative oscillation. These results are beneficial to the process parameter optimization and geometrical configuration design of the MOCVD reactor.