Application of strongly ionized AC tokamak plasma for synthesis of TiN thin films

作者：Ye MY^*; Matsuda O; Ohno N; Uesugi Y; Takagi M; Takamura S

来源：Vacuum, 2000, 59(1): 55-62.

DOI：10.1016/S0042-207X(00)00254-2

• AC tokamak discharge
• strongly ionized plasma
• high duty
• reactive sputtering
• TiN thin-films formation

A full continuous AC tokamak operation with a plasma current of +/-600 A and a frequency of 60-100 Hz has been achieved for 1 min in CSTN-AC tokamak device by employing a new invertor power supply system. As an AC toroidal plasma source, it has been used for the studies of deposition of thin films. The duty of AC discharges can be controlled arbitrarily from less than 1 to 100%. A good titanium nitride(TiN) thin-film formation by reactive sputtering is obtained in high-duty AC tokamak with strongly ionized plasmas with a high-charged particle density beyond 10(18) m(-3), in an extremely low gas pressure of the order of 10(-5) mbar. The deposited thin films were analyzed by various surface diagnostics (SEM, EDAX, XPS, RES).

• 出版日期2000-10