A new setup for localized implantation and live-characterization of keV energy multiply charged ions at the nanoscale

作者：Guillous S^*; Bourin C; D'Etat B Ban; Benyagoub A; Cassimi A; Feierstein C; Gardes E; Giglio E; Girard S; Grygiel C; Houel A; Lebius H; Mery A; Monnet I; Ramillon J M; Rangama J; Ropars F; Verzeroli E; Viteau M; Delobbe A

来源：Review of Scientific Instruments, 2016, 87(11): 113901.

DOI：10.1063/1.4966675

An innovative experimental setup, PELIICAEN, allowing the modification of materials and the study of the effects induced by multiply charged ion beams at the nanoscale is presented. This ultra-high vacuum (below 5 x 10(-10) mbar) apparatus is equipped with a focused ion beam column using multiply charged ions and a scanning electron microscope developed by Orsay Physics, as well as a scanning probe microscope. The dual beam approach coupled to the scanning probe microscope achieves nanometer scale in situ topological analysis of the surface modifications induced by the ion beams. Preliminary results using the different on-line characterization techniques to study the formation of nano-hillocks on silicon and mica substrates are presented to illustrate the performances of the setup. Published by AIP Publishing.

• 出版日期2016-11
• 单位中国地震局