Arrays of magnetic nanoparticles patterned via "dip-pen" nanolithography

作者:Liu XG; Fu L; Hong SH; Dravid VP*; Mirkin CA
来源:Advanced Materials, 2002, 14(3): 231-+.
DOI:10.1002/1521-4095(20020205)14:3<231::AID-ADMA231>3.0.CO;2-R

摘要

A versatile new method for generating magnetic nanostructures with dimensions ranging from several hundred nanometers to sub-100 nm is presented here. The method is based on dip-pen nanolithography and allows precise feature size control by tuning the tip-substrate contact time and the scan speed. The Figure shows an AFM topography image of an array of iron oxide nanodots on a gold substrate.