摘要
A versatile new method for generating magnetic nanostructures with dimensions ranging from several hundred nanometers to sub-100 nm is presented here. The method is based on dip-pen nanolithography and allows precise feature size control by tuning the tip-substrate contact time and the scan speed. The Figure shows an AFM topography image of an array of iron oxide nanodots on a gold substrate.
- 出版日期2002-2-5
- 单位西北大学