Stability Study of Solution-Processed Zinc Tin Oxide Thin-Film Transistors

作者：Zhang Xue; Ndabakuranye Jean Pierre; Kim Dong Wook; Choi Jong Sun; Park Jaehoon^*

来源：Electronic Materials Letters, 2015, 11(6): 964-972.

DOI：10.1007/s13391-015-5209-4

• thin-film transistor
• oxide semiconductor
• solution process
• reliability

In this study, the environmental dependence of the electrical stability of solution-processed n-channel zinc tin oxide (ZTO) thin-film transistors (TFTs) is reported. Under a prolonged negative gate bias stress, a negative shift in threshold voltage occurs in atmospheric air, whereas a negligible positive shift in threshold voltage occurs under vacuum. In the positive bias-stress experiments, a positive shift in threshold voltage was invariably observed both in atmospheric air and under vacuum. In this study, the negative gate-bias-stress-induced instability in atmospheric air is explained through an internal potential in the ZTO semiconductor, which can be generated owing to the interplay between H2O molecules and majority carrier electrons at the surface of the ZTO film. The positive bias-stress-induced instability is ascribed to electron-trapping phenomenon in and around the TFT channel region, which can be further augmented in the presence of air O-2 molecules. These results suggest that the interaction between majority carriers and air molecules will have crucial implications for a reliable operation of solution-processed ZTO TFTs.

• 出版日期2015-11