摘要
We investigated the effect of ZnO layer thickness on the optical and electrical properties of ZnO/Ag/ZnO multilayer films deposited on glass substrates. The transmission window became wider and shifted toward the lower energy side with increasing ZnO thickness. The ZnO/Ag/ZnO (40 nm/18.8 nm/40 nm) multilayer sample showed transmittance of similar to 96% at 550nm. As the ZnO thickness was increased from 8 nm to 80 nm, the carrier concentration gradually decreased from 1.74 x 10(22) cm(-3) to 4.33 x 10(21) cm(-3), while the charge mobility varied from 23.8 cm(2)/V-s to 24.8 cm(2)/V-s. With increasing ZnO thickness, the samples exhibited similar sheet resistances of 3.6 Omega/sq to 3.9 Omega/sq, but the resistivity increased by a factor of 4.58. The samples showed smooth surfaces with root-mean-square roughness in the range of 0.47 nm to 0.94 nm. Haacke's figure of merit (FOM) was calculated for all the samples; the ZnO (40 nm)/Ag (18.8 nm)/ZnO (40 nm) multilayer produced the highest FOM of 148.9 x 10(-3) Omega(-1).
- 出版日期2015-10