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摘要
Titanium nitride films were grown by unbalanced magnetron sputtering at different N2 and Ar partial pressure ratios on Ti6Al4V alloy substrate. Its microstructures and mechanical properties were characterized with X-ray diffraction (XRD), atomic force microscopy(AFM) and the widely used conventional techniques. The results showed that the compact TiN films, grown at low N2 and Ar partial pressure ratios, significantly improved the mechanical properties of the alloy. For example, its micro-hardness, wear-resistance and corrosion-resistance were much higher than that of the control sample. Moreover, we found that the N2 and Ar partial pressure ratio strongly affected the microstructures of the TiN films.
- 出版日期2007
- 单位西南交通大学
